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Journal of Synchrotron Radiation / Editor's Choice (JSR-07-2) Contact: Andrea Sharpe, as@iucr.org Second in a series of quarterly highlights from JSR, selected by the JSR editors for publishing on lightsources.org and in the IUCr Newsletter. The authors of the journal article also wrote this summary. Chemically selective soft X-ray patterning of polymers J. Wang, H.D.H. Stöver, A.P. Hitchcock and T. Tyliszczak J. Synchrotron Rad. (2007). 14, 181–190 Using monochromated soft X-rays and a two-layer polymer structure, Wang et al. have demonstrated chemically selective patterning using the high brightness, fine focused, 50 nm beam of the polymer scanning transmission X-ray microscope (STXM) at the Advanced Light Source. Writing and reading at strong absorption lines was used to make and image patterns independently in polymethylmethacrylate (288.4 eV) and polyacrylonitrile (286.8 eV) layers using STXM. Examples include (a) the logo of Lawrence Berkeley National Lab, (b) the logo of the Canadian Light Source (PMMA = red, PAN = blue) and (c) 'Smokie' (PMMA = brown, PAN = grey); (d) input. Scale bar = 1 micron. [Note: Experiments were performed using STXM at beamline 5.3.2 at the Advanced Light Source (Lawrence Berkeley National Laboratory). Lawrence Berkeley National Laboratory is funded by the U.S. Department of Energy's Office of Science. The contents of all materials on lightsources.org are the sole responsibility of the authors of the materials and/or the facilities or institutions under whose auspices the materials were produced. -lightsources.org]
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